Engineered from high-purity graphite, the graphite targets exhibit exceptional thermal stability, superior heat resistance, and a low coefficient of thermal expansion. These targets are critical for depositing high-performance carbon films in sectors such as semiconductors, photovoltaics, and advanced battery materials, where maintaining material integrity during high-temperature processing is paramount.
Outstanding Features of Graphite Target
l High Thermal Stability
It maintains stable performance in high-power, high-temperature sputtering processes, ensuring uniform film deposition.
l Low Thermal Expansion Coefficient
It is dimensionally stable under temperature changes, reducing deposition stress and enhancing the film's density and adhesion.
l Excellent Electrical Conductivity
Graphite targets have good electrical conductivity, making them suitable for the preparation of electronic devices, functional films, and conductive layers.
Wide Applications of Graphite Target
l Semiconductor Manufacturing
Graphite targets are used for preparing conductive films, carbon barrier layers, and interconnect layers, ensuring high performance and stability of devices.
l Optical Component Manufacturing
Used for preparing carbon films, anti-reflection coatings, and infrared absorption films, widely applied in optical components, laser devices, and infrared windows.
l Photovoltaic Industry
Used in photovoltaic cell back electrodes, fuel cell carbon layers, and supercapacitor conductive layers, enhancing energy conversion efficiency and device lifespan.
l Aerospace
Films deposited by graphite targets can serve as high-temperature protective coatings, improving heat resistance and wear resistance.
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High Purity Graphite Sputtering Target Hot Pressing Sintering Process Images
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